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RIS citation export for TUPA15: Development of a CVD System for Next-Generation SRF Cavities

TY  - CONF
AU  - Gaitan, G.
AU  - Bishop, P.
AU  - Holic, A.T.
AU  - Kulina, G.
AU  - Liepe, M.
AU  - Sears, J.
AU  - Sun, Z.
AU  - Wendland, B.W.
ED  - Biedron, Sandra
ED  - Simakov, Evgenya
ED  - Milton, Stephen
ED  - Anisimov, Petr M.
ED  - Schaa, Volker R.W.
TI  - Development of a CVD System for Next-Generation SRF Cavities
J2  - Proc. of NAPAC2022, Albuquerque, NM, USA, 07-12 August 2022
CY  - Albuquerque, NM, USA
T2  - International Particle Accelerator Conference
T3  - 5
LA  - english
AB  - Next-generation, thin-film surfaces employing Nb₃Sn, NbN, NbTiN, and other compound superconductors are destined to allow reaching superior RF performance levels in SRF cavities. Optimized, advanced deposition processes are required to enable high-quality films of such materials on large and complex-shaped cavities. For this purpose, Cornell University is developing a remote plasma-enhanced chemical vapor deposition (CVD) system that facilitates coating on complicated geometries with a high deposition rate. This system is based on a high-temperature tube furnace with a clean vacuum and furnace loading system. The use of plasma alongside reacting precursors will significantly reduce the required processing temperature and promote precursor decomposition. The system can also be used for annealing cavities after the CVD process to improve the surface layer. The chlorine precursors have the potential to be corrosive to the equipment and pose specific safety concerns. A MATLAB GUI has been developed to control and monitor the CVD system at Cornell.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 372
EP  - 374
KW  - cavity
KW  - controls
KW  - SRF
KW  - GUI
KW  - vacuum
DA  - 2022/10
PY  - 2022
SN  - 2673-7000
SN  - 978-3-95450-232-5
DO  - doi:10.18429/JACoW-NAPAC2022-TUPA15
UR  - https://jacow.org/napac2022/papers/tupa15.pdf
ER  -