Author: Schenkel, T.
Paper Title Page
Micro-Electromechanical Systems Based Multi-Beam Ion Accelerators  
  • Q. Ji, A. Amsellem, A. Persaud, Z. Qin, T. Schenkel, P.A. Seidl, N. Valverde
    LBNL, Berkeley, California, USA
  • K. Afridi, V. Gund, Y. Hou, A. Lal, D. Ni
    Cornell University, Ithaca, New York, USA
  • S.M. Lund
    FRIB, East Lansing, Michigan, USA
  Funding: This work was funded by ARPA-E. Work at LBNL was conducted under DOE Contract DE-AC0205CH11231. Device fabrication at the Cornell Nano Fabrication facility is supported by NSF Grant No. ECCS-1542081.
We report on the development of multi-beam radio frequency (RF) linear ion accelerators that are formed from stacks of low-cost printed circuit boards. An array of 112 beamlets is formed using MEMS techniques in 4" wafers. The peak argon ion current accelerated in the 112-beamlet column to date is 0.5 mA [1]. We have accelerated ions in stacks of 32 wafers to an energy of 100 keV. The measured energy gain in each RF gap reached 6.5 keV on average, resulting in an effective acceleration gradient of 0.4 MV/m. We will describe how this approach to multi-beam RF ion acceleration can scale to high beam power for applications in material processing and nuclear materials development.
[1] Qing Ji, et al., "Beam power scale-up in micro-electromechanical systems based multi-beam ion accelerators", Rev. Sci. Instr. 92, 103301 (2021);
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