|WEPA56||Encapsulation of Photocathodes Using High Power Pulsed RF Sputtering of hBN||cathode, simulation, electron, vacuum||760|
Funding: This work is supported by the US DOE SBIR program under contract number DE-SC0021511 and DE-SC0020573.
Photocathodes of various materials are used in photoinjectors for generating photoelectron beams. Of particular interest are the alkali antimonides because of their ultra-high quantum efficiency (QE) and relatively low requirements for growth, and metallic materials such as Cu and Mg which have lower QE but are easier to maintain and have longer lifetime. The biggest challenge of using the alkali antimonide photocathode is that it has an extremely stringent requirement on vacuum and is destroyed rapidly by residual air in the system, while exposure of Mg and Cu in air also impacts the photocathode performance because of the oxidation. The photocathode can be protected against harmful gas molecules by using one or two monolayers of a 2D material such as graphene or hexagonal boron nitride (hBN). Furthermore, hBN monolayers even have the potential to improve the QE of the photocathode when working as the encapsulation thin-film. In this paper, we will discuss the feasibility of coating a photocathode with hBN by high power pulsed RF sputtering by using metallic photocathodes as examples, and compare the performance with encapsulated photocathodes with transferred hBN thin-films.
|DOI •||reference for this paper ※ doi:10.18429/JACoW-NAPAC2022-WEPA56|
|About •||Received ※ 31 July 2022 — Revised ※ 04 August 2022 — Accepted ※ 08 August 2022 — Issue date ※ 10 August 2022|
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