JACoW is a publisher in Geneva, Switzerland that publishes the proceedings of accelerator conferences held around the world by an international collaboration of editors.
@inproceedings{huber:napac2022-mopa62,
author = {W.M. Huber and I. Haehnlein and T.J. Houlahan and B.E. Jurczyk and A.S. Morrice and R.A. Stubbers},
title = {{High Quality Conformal Coatings on Accelerator Components via Novel Radial Magnetron with High-Power Impulse Magnetron Sputtering}},
& booktitle = {Proc. NAPAC'22},
booktitle = {Proc. 5th Int. Particle Accel. Conf. (NAPAC'22)},
pages = {182--184},
eid = {MOPA62},
language = {english},
keywords = {GUI, niobium, target, plasma, SRF},
venue = {Albuquerque, NM, USA},
series = {International Particle Accelerator Conference},
number = {5},
publisher = {JACoW Publishing, Geneva, Switzerland},
month = {10},
year = {2022},
issn = {2673-7000},
isbn = {978-3-95450-232-5},
doi = {10.18429/JACoW-NAPAC2022-MOPA62},
url = {https://jacow.org/napac2022/papers/mopa62.pdf},
abstract = {{In this work, we present two configurations of a novel radial magnetron design that are suitable for coating the complex inner surfaces of a variety of modern particle accelerator components. These devices have been used in conjunction with high-power impulse magnetron sputtering (HiPIMS) to deposit copper and niobium films onto the inner surfaces of bellows assemblies, waveguides, and SRF cavities. These films, with thicknesses of up to 3 µm and 40 µm for niobium and copper, respectively, have been shown to be conformal, adherent, and conductive. In the case of copper, the post-bake RRR values of the resulting films are well within the range specified for electroplating of the LCLS-II bellows and CEBAF waveguide assemblies. In addition to requiring no chemical processing beyond a detergent rinse and solvent degrease, this magnetron design exhibits over 80% target material utilization. Further, in the case of niobium, an enhancement in RRR over that of the bulk (target) material has been observed.}},
}