Author: Gaitan, G.
Paper Title Page
TUPA15 Development of a CVD System for Next-Generation SRF Cavities 372
  • G. Gaitan, P. Bishop, A.T. Holic, G. Kulina, J. Sears, Z. Sun
    Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
  • M. Liepe
    Cornell University, Ithaca, New York, USA
  • B.W. Wendland
    University of Minnesota, Minnesota, USA
  Funding: This research is funded by the National Science Foundation under Grant No. PHY-1549132, the Center for Bright Beams.
Next-generation, thin-film surfaces employing Nb3Sn, NbN, NbTiN, and other compound superconductors are destined to allow reaching superior RF performance levels in SRF cavities. Optimized, advanced deposition processes are required to enable high-quality films of such materials on large and complex-shaped cavities. For this purpose, Cornell University is developing a remote plasma-enhanced chemical vapor deposition (CVD) system that facilitates coating on complicated geometries with a high deposition rate. This system is based on a high-temperature tube furnace with a clean vacuum and furnace loading system. The use of plasma alongside reacting precursors will significantly reduce the required processing temperature and promote precursor decomposition. The system can also be used for annealing cavities after the CVD process to improve the surface layer. The chlorine precursors have the potential to be corrosive to the equipment and pose specific safety concerns. A MATLAB GUI has been developed to control and monitor the CVD system at Cornell.
DOI • reference for this paper ※ doi:10.18429/JACoW-NAPAC2022-TUPA15  
About • Received ※ 14 July 2022 — Revised ※ 08 August 2022 — Accepted ※ 09 August 2022 — Issue date ※ 22 August 2022
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