NAPAC2022 - List of Authors (Gaitan, G.)

Paper	Title	Page
TUPA15	Development of a CVD System for Next-Generation SRF Cavities	372
	G. Gaitan, P. Bishop, A.T. Holic, G. Kulina, J. Sears, Z. Sun Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA M. Liepe Cornell University, Ithaca, New York, USA B.W. Wendland University of Minnesota, Minnesota, USA
	Funding: This research is funded by the National Science Foundation under Grant No. PHY-1549132, the Center for Bright Beams. Next-generation, thin-film surfaces employing Nb₃Sn, NbN, NbTiN, and other compound superconductors are destined to allow reaching superior RF performance levels in SRF cavities. Optimized, advanced deposition processes are required to enable high-quality films of such materials on large and complex-shaped cavities. For this purpose, Cornell University is developing a remote plasma-enhanced chemical vapor deposition (CVD) system that facilitates coating on complicated geometries with a high deposition rate. This system is based on a high-temperature tube furnace with a clean vacuum and furnace loading system. The use of plasma alongside reacting precursors will significantly reduce the required processing temperature and promote precursor decomposition. The system can also be used for annealing cavities after the CVD process to improve the surface layer. The chlorine precursors have the potential to be corrosive to the equipment and pose specific safety concerns. A MATLAB GUI has been developed to control and monitor the CVD system at Cornell.
DOI •	reference for this paper ※ doi:10.18429/JACoW-NAPAC2022-TUPA15
About •	Received ※ 14 July 2022 — Revised ※ 08 August 2022 — Accepted ※ 09 August 2022 — Issue date ※ 22 August 2022
Cite •	reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)

Paper

Title

Page

Development of a CVD System for Next-Generation SRF Cavities

372

G. Gaitan, P. Bishop, A.T. Holic, G. Kulina, J. Sears, Z. Sun
Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
M. Liepe
Cornell University, Ithaca, New York, USA
B.W. Wendland
University of Minnesota, Minnesota, USA

Funding: This research is funded by the National Science Foundation under Grant No. PHY-1549132, the Center for Bright Beams.
Next-generation, thin-film surfaces employing Nb₃Sn, NbN, NbTiN, and other compound superconductors are destined to allow reaching superior RF performance levels in SRF cavities. Optimized, advanced deposition processes are required to enable high-quality films of such materials on large and complex-shaped cavities. For this purpose, Cornell University is developing a remote plasma-enhanced chemical vapor deposition (CVD) system that facilitates coating on complicated geometries with a high deposition rate. This system is based on a high-temperature tube furnace with a clean vacuum and furnace loading system. The use of plasma alongside reacting precursors will significantly reduce the required processing temperature and promote precursor decomposition. The system can also be used for annealing cavities after the CVD process to improve the surface layer. The chlorine precursors have the potential to be corrosive to the equipment and pose specific safety concerns. A MATLAB GUI has been developed to control and monitor the CVD system at Cornell.

DOI •

reference for this paper ※ doi:10.18429/JACoW-NAPAC2022-TUPA15

About •

Received ※ 14 July 2022 — Revised ※ 08 August 2022 — Accepted ※ 09 August 2022 — Issue date ※ 22 August 2022

Cite •

reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)